Zone plate for x-ray applications

Enzo Di Fabrizio, A. Nottola, S. Cabrini, F. Romanato, L. Vaccari, A. Massimi

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

High resolution and high efficiency Zone Plate for X-rays in the energy range of 300 eV and 12 KeV fabricated by means of electron beam and X-ray lithography are presented. Regarding the high resolution regime zone plate with 40 nm outermost zone and thickness of 0.2 μm are shown. For high efficiency performances, multilevel zone plate and continuous profile were fabricated to provide an increase of efficiency at the first diffraction order and to suppress higher ones. The combination of the two lithography allows a powerful flexibility at several energy regimes.

Original languageEnglish (US)
Pages (from-to)317-324
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4145
DOIs
StatePublished - Jan 1 2001

Keywords

  • Continuos profiling
  • Electron beam and X ray lithography
  • Electroplating
  • Zone Plate

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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