X-ray lithography for micro-and nano-fabrication at ELETTRA for interdisciplinary applications

Enzo Di Fabrizio, R. Fillipo, S. Cabrini, R. Kumar*, F. Perennes, M. Altissimo, L. Businaro, D. Cojac, L. Vaccari, M. Prasciolu, P. Candeloro

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

ELETTRA (http://www.elettra.trieste.it/index.html) is a third generation synchrotron radiation source facility operating at Trieste, Italy, and hosts a wide range of research activities in advanced materials analysis and processing, biology and nano-science at several various beam lines. The energy spectrum of ELETTRA allows x-ray nano-lithography using soft (1.5 keV) and hard x-ray (10 keV) wavelengths. The Laboratory for Interdisciplinary Lithography (LIILIT) was established in 1998 as part of an Italian national initiative on micro- and nano-technology project of INFM and is funded and supported by the Italian National Research Council (CNR), INFM and ELETTRA. LILIT had developed two dedicated lithographic beam lines for soft (1.5 keV) and hard x-ray (10 keV) for micro- and nano-fabrication activities for their applications in engineering, science and bio-medical applications. In this paper, we present a summary of our research activities in micro- and nano-fabrication involving x-ray nanolithography at LILIT's soft and hard x-ray beam lines.

Original languageEnglish (US)
JournalJournal of Physics Condensed Matter
Volume16
Issue number33
DOIs
StatePublished - Aug 25 2004

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics

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