X-ray lithography fabrication of a zone plate for X-rays in the range from 15 to 30 keV

Altissimo Matteo, Romanato Filippo, Vaccari Lisa, Businaro Luca, Cojoc Danut, Kaulich Burkhard, Cabrini Stefano, Enzo Di Fabrizio

Research output: Contribution to journalConference articlepeer-review

15 Scopus citations

Abstract

Progress on the fabrication of zone plates for hard X-rays is reported. The issue of achieving a high aspect ratio for lithographic structures has been addressed by developing a specific fabrication protocol based on the combined use of electron beam and proximity X-ray lithography. An example of a 1 mm diameter wide zone plate, optimized for a 23 keV X-ray beam, is presented, showing an aspect ratio of the outermost zone of up to 10. The most critical steps of the fabrication process are discussed on the basis of the results.

Original languageEnglish (US)
Pages (from-to)173-177
Number of pages5
JournalMicroelectronic Engineering
Volume61-62
DOIs
StatePublished - Jan 1 2002
EventMicro and Nano Engineering 2001 - Grenoble, France
Duration: Sep 16 2001Sep 19 2001

Keywords

  • X-ray lithography
  • Zone plates

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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