X-ray and electron-beam lithography of three-dimensional array structures for photonics

F. Romanato*, D. Cojoc, E. Di Fabrizio, M. Galli, D. Bajoni

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

The fabrication of 3D photonic crystal (PC) lattices with designed linear defects by electron beam lithography and multitilt x-ray exposures was analyzed. Different lithographies were used in order to control the design and the realization of the linear defects inside the three-dimensional structure. Nickel Yablonovite lattices with a lattice parameter of 1.8 μm and a total thickness of 15 μm were fabricated using the method. The optical reflectance measurements shows that the lattices possessed characteristic resonances as required for 3D PCs.

Original languageEnglish (US)
Pages (from-to)2912-2917
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number6
StatePublished - Nov 2003
Externally publishedYes

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

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