Wafer-Level Patterned and Aligned Polymer Nanowire/Micro- and Nanotube Arrays on any Substrate

Jenny Ruth Morber, Xudong Wang, Jin Liu, Robert L. Snyder, Zhong Lin Wang

Research output: Contribution to journalArticlepeer-review

47 Scopus citations

Abstract

A study was conducted to fabricate wafer-level patterned and aligned polymer nanowire (PNW), micro- and nanotube arrays (PNT), which were created by exposing the polymer material to plasma etching. The approach for producing wafer-level aligned PNWs involved a one-step inductively coupled plasma (ICP) reactive ion etching process. The polymer nanowire array was fabricated in an ICP reactive ion milling chamber with a pressure of 10mTorr. Argon (Ar), O 2, and CF4 gases were released into the chamber as etchants at flow rates of 15 sccm, 10 sccm, and 40 sccm. Inert gasses, such as Ar-form positive ions were incorporated to serve as a physical component to assist in the material degradation process. One power source (400 W) was used to generate dense plasma from the input gases, while another power source applied a voltage of approximately 600V to accelerate the plasma toward the substrate.
Original languageEnglish (US)
Pages (from-to)2072-2076
Number of pages5
JournalAdvanced Materials
Volume21
Issue number20
DOIs
StatePublished - May 25 2009
Externally publishedYes

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