Using soft lithography to pattern highly oriented polyacetylene (HOPA) films via solventless polymerization

Hongwei Gu*, Rongkun Zheng, Xixiang Zhang, Bing Xu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

40 Scopus citations

Abstract

A new application of the combination of soft lithography and solventless polymerization was demonstrated. It was used to pattern ultra-hard microstructures in selected areas using the highly oriented polyacetylene (HOPA) films as the precursor. The application was found to lead the formation of highly oriented films of other polymers, including electro-optically active polymers that require a high orientation order to achieve enhanced device performance. The results show that HOPA films are slightly more hydrophobic.

Original languageEnglish (US)
Pages (from-to)1356-1359
Number of pages4
JournalAdvanced Materials
Volume16
Issue number15 SPEC. ISS.
DOIs
StatePublished - Aug 3 2004

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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