Unique polymers via radical diene cyclization: Polyspironorbornanes and their application to 193 nm microlithography

Robert P. Meagley, Dario Pasini, Linus Y. Park, Jean M.J. Fréchet*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

The design of novel alkylated norcamphor derivatives that undergo cyclopolymerization is explored; the resulting polymers incorporate suitable functional groups for chemical amplification and show excellent imaging characteristics under lithographic exposure at 193 nm.

Original languageEnglish (US)
Pages (from-to)1587-1588
Number of pages2
JournalChemical Communications
Issue number16
StatePublished - Aug 21 1999
Externally publishedYes

ASJC Scopus subject areas

  • Catalysis
  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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