Ultraviolet laser deposition of graphene thin films without catalytic layers

S. R. Sarath Kumar, Husam N. Alshareef

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

Abstract

In this letter, the formation of nanostructured graphene by ultraviolet laser ablation of a highly ordered pyrolytic graphite target under optimized conditions is demonstrated, without a catalytic layer, and a model for the growth process is proposed. Previously, graphene film deposition by low-energy laser (2.3 eV) was explained by photo-thermal models, which implied that graphene films cannot be deposited by laser energies higher than the C-C bond energy in highly ordered pyrolytic graphite (3.7 eV). Here, we show that nanostructured graphene films can in fact be deposited using ultraviolet laser (5 eV) directly over different substrates, without a catalytic layer. The formation of graphene is explained by bond-breaking assisted by photoelectronic excitation leading to formation of carbon clusters at the target and annealing out of defects at the substrate.
Original languageEnglish (US)
Pages (from-to)012110
JournalApplied Physics Letters
Volume102
Issue number1
DOIs
StatePublished - Jan 10 2013

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Ultraviolet laser deposition of graphene thin films without catalytic layers'. Together they form a unique fingerprint.

Cite this