Ultra-thin high quality oxynitride formed by NH3nitridation and high pressure O2Re-oxidation

T. Y. Luo*, V. H C Watt, H. N. Al-Shareef, G. A. Brown, A. Karamcheti, M. D. Jackson, H. R. Huff, B. Evans, D. L. Kwong

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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Engineering & Materials Science