UHV CAFM characterization of high-k dielectrics: Effect of the technique resolution on the pre- and post-breakdown electrical measurements

M. Lanza, M. Porti, M. Nafría, X. Aymerich, E. Whittaker, B. Hamilton

Research output: Chapter in Book/Report/Conference proceedingConference contribution

27 Scopus citations

Abstract

In this work, a Conductive Atomic Force Microscopy (CAFM) working in contact mode has been used to compare the measured electrical properties and breakdown (BD) on ultra thin high-k dielectrics, when different environmental conditions are used. In particular, the effect of the environment on the conductivity measurements, the lateral resolution in current images and the lateral propagation of the BD event will be analyzed in air, dry nitrogen (N2) and Ultra High Vacuum (UHV). © 2010 Elsevier Ltd. All rights reserved.
Original languageEnglish (US)
Title of host publicationMicroelectronics Reliability
Pages1312-1315
Number of pages4
DOIs
StatePublished - Sep 1 2010
Externally publishedYes

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Safety, Risk, Reliability and Quality
  • Condensed Matter Physics

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