Two-dimensional photonic crystal waveguide obtained by e-beam direct writing of SU8-2000 photoresist

M. De Vittorio*, M. T. Todaro, T. Stomeo, R. Cingolani, D. Cojoc, Enzo Di Fabrizio

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

40 Scopus citations

Abstract

We report on the direct electron-beam patterning of a negative tone resist SU8-2000 for the fabrication of a two-dimensional photonic crystal (2D-PC) waveguide. The high refractive index of the SU8-2000 (about 1.69), its transparency above 360 nm, the good mechanical stability and the possibility of direct patterning by electron-beam lithography, make such resist ideal for the direct realization of high-resolution photonic crystal waveguides. The fabrication of a triangular array of sub-micron pillars (lattice constant of 300 nm and filling factor of 0.35) suitable for the realization of a 2D-PC waveguide on a glass substrate is reported. The energy dispersion diagram, calculated by the plane wave expansion technique, shows that this 2D-PC structure has a small photonic band gap (PBG) for the TM-like modes.

Original languageEnglish (US)
Pages (from-to)388-391
Number of pages4
JournalMicroelectronic Engineering
Volume73-74
DOIs
StatePublished - Jan 1 2004
EventMicro and Nano Engineering 2003 - Cambridge, United Kingdom
Duration: Sep 22 2003Sep 25 2003

Keywords

  • Electron-beam lithography
  • Photoresist
  • Polymeric photonic crystals

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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