Towards surface growth lithography using polymer bound photoactive acid generators

Zachary M. Fresco*, Jean Frechet

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Surface growth lithography is an attractive technique that eliminates the need for resist transparency. Critical to the success of this method is a smooth and homogeneous film capable of immobilizing a high concentration of initiator on the surface. This report outlines the design, synthesis, and preliminary testing of a polymeric photoactive acid generator (PAG), which is suitable for use with cationic surface growth lithography.

Original languageEnglish (US)
Pages (from-to)23-26
Number of pages4
JournalJournal of Photopolymer Science and Technology
Volume16
Issue number1
DOIs
StatePublished - Jan 1 2003

Keywords

  • Initiating surface
  • Polymeric photoacid generator

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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