Top-down and bottom-up nanofabrication for multipurpose applications

Enzo Di Fabrizio*, Filippo Romanato, Stefano Cabrini, Francesco Deangelis, Arum Amy Yu, Rober Barsotti, Gioia Della Giustina, Giovanna Brusatin, Fracesco Stellacci

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this article we will show three recent examples of combined strategies aiming at merging top-down and bottom-up approach for nanofabrication at nanoscale level. The first example shows the fabrication of nanogaps performed by Focus Ion Beam technique that have been used to measure the conductivity of few gold nanoparticles aggregates deposited by Dip Pen lithography. The second example deals with the parallel replica of high resolution master generated by Electron Beam lithography by means of an innovative lithographic process based on DNA supramolecular nano-stamping. The latter example proposes the possibility to generate, through radiation exposure, direct patterning of hybrid sol gel material doped with fluorescent molecules. The outline of the fabrication approaches and their scientific and technical perspective are discussed.

Original languageEnglish (US)
Title of host publicationNanomanufacturing
Pages54-65
Number of pages12
Volume921
StatePublished - 2006
Externally publishedYes
Event2006 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 17 2006Apr 21 2006

Other

Other2006 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period04/17/0604/21/06

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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