Thermal response of Ru electrodes in contact with SiO 2 and Hf-based high-k gate dielectrics

H. C. Wen, P. Lysaght, Husam Niman Alshareef, C. Huffman, H. R. Harris, K. Choi, Y. Senzaki, H. Luan, P. Majhi, B. H. Lee, M. J. Campin, B. Foran, G. D. Lian, D. L. Kwong

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Physics & Astronomy