The interface anisotropy of Fe Ti multilayers prepared by dual-facing-target sputtering

M. S. Liu, E. Y. Jiang*, Z. J. Wang, Xixiang Zhang, Y. G. Liu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

We have fabricated Fe Ti multilayers by the dual-facing-target sputtering (DFTS) method. The total interaction effective field Heff of Fe Ti multilayers were determined from the ferromagnetic resonance data in a rotating external magnetic field. The interface contribution to the magnetic anisotropy was extracted from the anisotropy field HA that was obtained from Heff. The interface anisotropy constant of Fe Ti multilayers Ks is 0.18 erg/cm2. This indicates the presence of a perpendicular interface anisotropy.

Original languageEnglish (US)
Pages (from-to)537-538
Number of pages2
JournalJournal of Magnetism and Magnetic Materials
Volume140-144
Issue numberPART 1
DOIs
StatePublished - Jan 1 1995

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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