The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode

K. Choi*, H. C. Wen, Husam Niman Alshareef, R. Harris, P. Lysaght, H. Luan, P. Majhi, B. H. Lee

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

35 Scopus citations

Abstract

We demonstrate that the effective work function (EWF) of atomic layer deposited (ALD) TiN electrodes is a function of the TiN film thickness and that the metal/dielectric interface and the bulk metal film influence this measured response. It is shown that anneal treatments and chemical processing of the underlying dielectric surface prior to electrode deposition may be exploited to modify the effective work function of metal electrodes. The effect of physical vapor deposited (PVD) and ALD metal over-layers on the effective work function of metal electrodes is also presented.

Original languageEnglish (US)
Title of host publicationProceedings of ESSDERC 2005
Subtitle of host publication35th European Solid-State Device Research Conference
Pages101-104
Number of pages4
DOIs
StatePublished - Dec 1 2005
EventESSDERC 2005: 35th European Solid-State Device Research Conference - Grenoble, France
Duration: Sep 12 2005Sep 16 2005

Publication series

NameProceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference
Volume2005

Other

OtherESSDERC 2005: 35th European Solid-State Device Research Conference
CountryFrance
CityGrenoble
Period09/12/0509/16/05

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint

Dive into the research topics of 'The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode'. Together they form a unique fingerprint.

Cite this