In this paper, we report on the influence of surface temperature on low-energy H- electron stimulated desorption occurring via dissociative electron attachment from hydrogenated diamond films. By measuring the H- kinetic energy distribution (KED) induced by electron bombardment in the 7-18 eV range for surface temperatures ranging between 100 and 450 K, we investigate the dynamics of the desorption process. It is determined that the H- ion yield continuously decreases with increasing temperature and that the most probable H- kinetic energy shifts to lower energies. It is proposed that the effect of temperature on the H-, KED and consequently, on the reduction in ion yield is predominantly due to an increase in the energy relaxation of the anion resonance and energy losses of the outgoing H- ion through interactions with the solid's multiphonon background and collisions.
|Original language||English (US)|
|Number of pages||5|
|Journal||Physical Review B - Condensed Matter and Materials Physics|
|State||Published - Jan 1 2001|
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics