Syudy on a method of the thickness measurement of ultra-thin PtSi film

Shuang Liu*, Yong Gong Ning, Yi Zhang, Huai Wu Zhang, Ai Chen, Jun Gang Liu, Jia De Yang, Kun Li

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Based on X-ray photoelectron spectrum intensity measurements of thin film by ARXPS, a method of determination of the thickness of PtSi ultra-thin films through calculations of electrom mean free path, is described in this article. The result of calculation is in agreement with that of the TEM crystal lattice images analysis. It shows that the method is convenient and can be used to determine the thickness of other ultra-thin films.

Original languageEnglish (US)
Number of pages1
JournalWuli Xuebao/Acta Physica Sinica
Volume50
Issue number8
StatePublished - Aug 1 2001

Keywords

  • ARXPS
  • TEM crystal lattice images
  • Ultra-thin PtSi film

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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