Susceptors for induction heating with thermal uniformity

Xiaohang Li (Inventor), Kuang-Hui Li (Inventor), Hamad Saud ALOTAIBI (Inventor)

Research output: Patent

Abstract

Embodiments of the present disclosure describe a susceptor for chemical vapor deposition comprising a horizontal component with a top surface and a bottom surface, wherein the top surface is configured to support one or more wafers; a vertical component extending from the bottom surface of the horizontal component along a longitudinal axis that is substantially perpendicular to the horizontal component; and a hollow region within the vertical component. Embodiments of the present disclosure describe a susceptor for chemical vapor deposition comprising a horizontal plate with a top surface configured to support one or more wafers, a vertical rod integrated with and perpendicular to the horizontal plate, and a hollow region within the vertical rod for promoting temperature uniformity across the top surface of the horizontal plate.
Original languageEnglish (US)
Patent numberWO2018130953A1
StatePublished - Jul 19 2018

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