Suitable photo-resists for two-photon polymerization using femtosecond fiber lasers

V.P. Rajamanickam, L. Ferrara, A. Toma, R. Proietti Zaccaria, G. Das, Enzo M. Di Fabrizio, Carlo Liberale

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

We present suitable materials with good optical and mechanical properties, simple processing, efficient and optimized for two-photon polymerization (TPP) with femtosecond fiber lasers. We selected readily available acrylic monomer Bisphenol A ethoxylate diacrylate (BPA-EDA) with three different photo-initiators (PIs), isopropyl thioxanthone (ITX), 7-diethylamino-3-thenoylcoumarin (DETC), and 4,4′ bis(diethylamino) benzophenone (BDEB), since their absorption spectra match well with the laser wavelength at 780 nm. These PIs grant efficient radical generation, reactivity and high solubility in acrylic monomers. Finally, good optical and mechanical properties are demonstrated by the fabrication of different micro-structures.
Original languageEnglish (US)
Pages (from-to)135-138
Number of pages4
JournalMicroelectronic Engineering
Volume121
DOIs
StatePublished - Jun 2014

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Condensed Matter Physics

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