Subwavelength Si nanowire arrays for self-cleaning antireflection coatings

Yu An Dai, Hung Chih Chang, Kun Yu Lai, Chin An Lin, Ren Jei Chung, Gong Ru Lin, Jr-Hau He*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

73 Scopus citations

Abstract

Galvanic wet etching was adopted to fabricate Si nanowire arrays (NWAs) as a near-perfect subwavelength structure (SWS), which is an optically effective gradient-index antireflection (AR) surface and also exhibits super-hydrophobicity with an extremely high water contact angle (159°). Fresnel reflection and diffuse reflection over the broad spectrum can be eliminated by a Si NWA AR coating. Moreover, Si NWA SWSs show polarization-independent and omnidirectional AR properties. The wavelength-averaged specular and diffuse reflectance of Si NWA SWSs are as low as 0.06% and 2.51%, respectively. The effects of the surface profile of this biomimetic SWS on the AR and super-hydrophobic properties were investigated systematically.

Original languageEnglish (US)
Pages (from-to)10924-10930
Number of pages7
JournalJournal of Materials Chemistry
Volume20
Issue number48
DOIs
StatePublished - Dec 28 2010

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Chemistry

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