Sub-micron structured metal oxide gas sensors by means of lithographic techniques

Patrizio Candeloro*, Camilla Baratto, Elisabetta Comini, Guido Faglia, Enzo M. Di Fabrizio, Giorgio Sberveglieri

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this work we employed lithographic techniques, combined with sputtering depositions, to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the sub-micron scale, thus controlling the lateral size of the grains. Regarding the fabrication process, we followed two different approaches: a plain lift-off technique and a substrate patterning process. We present a comparison between the results of both the approaches. Furthermore, we tested the electrical responses to several gases and compared them with those of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.

Original languageEnglish (US)
Title of host publicationSemiconductor Materials for Sensing
EditorsS Seal, MI Baraton, C Parrish, N Murayama
PublisherMaterials Research Society
Pages103-108
Number of pages6
Volume828
ISBN (Print)1-55899-776-8
StatePublished - 2005
Externally publishedYes
EventSymposium on Semiconductor Materials for Sensing held at the 2004 MRS Fall Meeting - Boston, United States
Duration: Nov 29 2004Dec 2 2004

Publication series

NameMATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS
PublisherMATERIALS RESEARCH SOCIETY
Volume828
ISSN (Print)0272-9172

Conference

ConferenceSymposium on Semiconductor Materials for Sensing held at the 2004 MRS Fall Meeting
CountryUnited States
CityBoston
Period11/29/0412/2/04

Keywords

  • THIN-FILMS
  • SNO2

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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