SU-8 surface-micromachining process utilizing PMGI as a sacrificial material

Ian Grant Foulds, R. W. Johnstone, M. Parameswaran

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

8 Scopus citations

Abstract

This work presents a novel surface micromachining process based on the SU-8 polymer that uses the resist PMGI as a sacrificial layer as well as a lift-off resist for metal patterning. The process is capable of independent patterning of the structural and metal layers which decouples the mechanical and electrical properties of the resulting structures. The process uses inexpensive equipment and materials and can be completed in a single day, making this process ideal for proof of concept prototyping.

Original languageEnglish (US)
Title of host publicationProceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007
Pages291-294
Number of pages4
StatePublished - Dec 1 2007
Event20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007 - Kobe, Japan
Duration: Jan 21 2007Jan 25 2007

Publication series

NameProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN (Print)1084-6999

Other

Other20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007
CountryJapan
CityKobe
Period01/21/0701/25/07

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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