Structural sensitivity of the spin Hall magnetoresistance in antiferromagnetic thin films

A. Ross, R. Lebrun, Camilo Ulloa, Daniel A. Grave, Asaf Kay, L. Baldrati, Florian Kronast, Sergio Valencia, Avner Rothschild, Mathias Kläui

Research output: Contribution to journalArticlepeer-review

Abstract

Reading the magnetic state of antiferromagnetic (AFM) thin films is key for AFM spintronic devices. We investigate the underlying physics behind the spin Hall magnetoresistance (SMR) of bilayers of platinum and insulating AFM hematite (α-Fe2O3) and find an SMR efficiency of up to 0.1%, comparable to ferromagnetic-based structures. To understand the observed complex SMR field dependence, we analyze the effect of misalignments of the magnetic axis that arise during growth of thin films, by electrical measurements and direct magnetic imaging, and find that a small deviation can result in significant signatures in the SMR response. This highlights the care that must be taken when interpreting SMR measurements on AFM spin textures.
Original languageEnglish (US)
JournalPhysical Review B
Volume102
Issue number9
DOIs
StatePublished - Sep 10 2020
Externally publishedYes

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