Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties

Yi Ruei Lin, K. Y. Lai, Hsin Ping Wang, Jr-Hau He*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

68 Scopus citations

Abstract

Slope-tunable Si nanorod arrays (NRAs) were fabricated with colloidal lithography and reactive ion etching (RIE). Sharpened NRAs fabricated by increasing the SF 6 /O 2 flow ratio during RIE exhibit enhanced antireflection (AR) and hydrophobic properties, which are attributed to the smooth gradient in the effective refractive index of NRAs, and the enlarged water/air interface of the water drops in the NRA layers, respectively. Enhanced AR characteristics via modifying the slope of NRAs are accompanied by broad-band working ranges, omnidirectionality, and polarization insensitivity. Detailed experimental and theoretical analysis of slope-tunable NRAs should benefit the development of various self-cleaning optoelectronic devices with efficient light management.

Original languageEnglish (US)
Pages (from-to)2765-2768
Number of pages4
JournalNanoscale
Volume2
Issue number12
DOIs
StatePublished - Nov 1 2010

ASJC Scopus subject areas

  • Materials Science(all)

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