Shape-controlled fabrication of micro/nanoscale triangle, square, wire-like, and hexagon pits on silicon substrates induced by anisotropic diffusion and silicide sublimation

Huatao Wang, Zhou Zhang, Lai Mun Wong, Shijie Wang, Zhipeng Wei, Gong Ping Li, Guozhong Xing, Donglai Guo, Dandan Wang, Tao Wu*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

We report the fabrication of micro/nanoscale pits with facile shape, orientation, and size controls on an Si surface via an Au-nanoparticles-assisted vapor transport method. The pit dimensions can be continuously tuned from 70 nm to several μm, and the shapes of triangles, squares, and wire/hexagons are prepared on Si (111), (100), and (110) substrates, respectively. This reliable shape control hinges on the anisotropic diffusivity of Co in Si and the sublimation of cobalt silicide nanoislands. The experimental conditions, in particular the substrate orientation and the growth temperature, dictate the pit morphology. On the basis of this understanding of the mechanism and the morphological evolution of the pits, we manage to estimate the diffusion coefficients of Co in bulk Si along the 〈100〉 and 〈111〉 directions, that is D100 and D111. These diffusion coefficients show strong temperature dependence, for example, D100 is ca. 3 times larger than D111 at 860 °C, while they approach almost the same value at 1000 °C. This simple bottom-up route may help to develop new technologies for Si-based nanofabrication and to find potential applications in constructing nanodevices.

Original languageEnglish (US)
Pages (from-to)2901-2909
Number of pages9
JournalACS Nano
Volume4
Issue number5
DOIs
StatePublished - May 25 2010

Keywords

  • Anisotropic diffusion
  • Morphology control
  • Pits
  • Silicide

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)
  • Physics and Astronomy(all)

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