RESINES POUR UV LOINTAIN METTANT EN OEUVRE UN MECANISME D'AMPLIFICATION CHIMIQUE.

Translated title of the contribution: Senstive Deep UV Resist Incorporation Chemical Amplification.

J. M J Frechet*, Hiroshi Ito, C. Grant Willson

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

81 Scopus citations
Translated title of the contributionSenstive Deep UV Resist Incorporation Chemical Amplification.
Original languageFrench
Title of host publicationUnknown Host Publication Title
PublisherComite du Colloque Int sur la Microlithographie
Pages260
Number of pages1
StatePublished - 1982
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)

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