Resist system based on the cationic photocrosslinking of poly(4-hydroxystrene) and polyfunctional electrophiles

J. T. Fahey*, J. M J Frechet, N. Clecak, C. G. Wilson

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Resist systems based on acid-catalyzed electrophilic aromatic substitution have been demonstrated. These systems show high sensitivity and high resolution. The design allows for aqueous base development avoiding the swelling normally associated with negative crosslinking resists. Chemical amplification is achieved due to the catalytic nature of the crosslinking reaction involved. Further improvements in resist sensitivity and resolution may be achieved through different formulations and optimization of development conditions. We are currently developing other crosslinkers that may possess enhanced characteristics for this process.

Original languageEnglish (US)
Pages (from-to)241-242
Number of pages2
JournalPolymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering
Volume64
StatePublished - 1991
Externally publishedYes

ASJC Scopus subject areas

  • Chemical Engineering (miscellaneous)
  • Polymers and Plastics

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