Reactively sputtered epitaxial γ′-Fe4N films: Surface morphology, microstructure, magnetic and electrical transport properties

Wenbo Mi, Zaibing Guo, X. P. Feng, Haili Bai

Research output: Contribution to journalArticlepeer-review

61 Scopus citations

Abstract

Epitaxial γ′-Fe4N films with (1 0 0) and (1 1 0) orientations have been fabricated by reactive sputtering; these films were characterized by X-ray θ-2θ and φ scans, pole figures and high-resolution transmission electron microscopy. The film surface is very smooth as the film is less than 58 nm thick. The films exhibit soft ferromagnetism, and the saturation magnetization decreases with an increase in temperature, following Bloch's spin wave theory. The films also exhibit a metallic conductance mechanism. Below 30 K, magnetoresistance (MR) is positive and increases linearly with the applied field in the high-field range. In the low-field range, MR increases abruptly. Above 30 K, MR is negative, and its value increases linearly with the applied field.
Original languageEnglish (US)
Pages (from-to)6387-6395
Number of pages9
JournalActa Materialia
Volume61
Issue number17
DOIs
StatePublished - Oct 2013

ASJC Scopus subject areas

  • Polymers and Plastics
  • Metals and Alloys
  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

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