Rapid patterning of single-wall carbon nanotubes by interlayer lithography

Dong Seok Leem, Sungsoo Kim, Ji Whan Kim, Jung Inn Sohn, Angharad Edwards, Jingsong Huang, Xuhua Wang, Jang Joo Kim, Donal D.C. Bradley, John C. Demello

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells. Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Original languageEnglish (US)
JournalSmall
Volume6
Issue number22
DOIs
StatePublished - Nov 22 2010
Externally publishedYes

Fingerprint Dive into the research topics of 'Rapid patterning of single-wall carbon nanotubes by interlayer lithography'. Together they form a unique fingerprint.

Cite this