Printed wax masks for 254 nm deep-UV pattering of PMMA-based microfluidics

Yiqiang Fan, Yang Liu, Huawei Li, Ian G. Foulds

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

This paper reports a new technique for masking deep-UV exposure of poly(methyl methacrylate) (PMMA) using a printed wax mask. This technique provides an inexpensive and bulk fabrication method for PMMA structures. The technique involves the direct printing of the mask onto a polymer sheet using a commercial wax printer. The wax layer was then transferred to a PMMA substrate using a thermal laminator, exposed using deep-UV (with a wavelength of 254 nm), developed in an IPA:water solution, and completed by bonding on a PMMA cap layer. A sample microfluidic device fabricated with this method is also presented, with the microchannel as narrow as 50 μm. The whole process is easy to perform without the requirement for any microfabrication facilities. © 2012 IOP Publishing Ltd.
Original languageEnglish (US)
Pages (from-to)027001
JournalJournal of Micromechanics and Microengineering
Volume22
Issue number2
DOIs
StatePublished - Jan 13 2012

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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