Poly[p-(formyloxy)styrene]: Synthesis and Radiation-Induced Decarbonylation

Jean Frechet*, Theodore G. Tessier, C. Grant Willson, Hiroshi Ito

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

58 Scopus citations

Abstract

Poly[p-(formyloxy)styrene] is prepared by chemical modification of poly(p-hydroxystyrene) or free-radical-initiated polymerization of the corresponding monomer. Unlike poly(p-acetoxystyrene), which undergoes a partial photochemical Fries rearrangement, poly[p-(formyloxy)styrene] decarbonylates smoothly when exposed to UV irradiation in solution or in the solid state. The difference in reactivity between the two acylated polymers is likely due to the lower stability of the formyl radical which is formed in the first stage of the photo-Fries reaction. In addition, while uniform irradiation of a 1-μm Film of poly(p-acetoxystyrene) is impossible because of the formation of a strongly absorbing and UV stabilizing polymer at the surface of the exposed film, poly[p-(formyloxy)styrene] can be used in microlithographic processes to produce high-resolution relief images. The images can be developed with positive or negative tone by differential dissolution of the exposed and unexposed areas of the polymer film by using solvents of appropriate polarities.

Original languageEnglish (US)
Pages (from-to)317-321
Number of pages5
JournalMacromolecules
Volume18
Issue number3
DOIs
StatePublished - Jan 1 1985

ASJC Scopus subject areas

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry

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