Polymers for 193-nm microlithography: Regioregular 2-alkoxycarbonylnortricyclene polymers by controlled cyclopolymerization of bulky ester derivatives of norbornadiene

Q. Jason Niu, Jean M.J. Fréchet*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

48 Scopus citations

Abstract

Double duty for the tert-butyl residue: The bulky substituent in monomer 1 favors free-radical cyclopolymerization with maleic anhydride to give the regioregular nortricyclene copolymer 2. When the polymer is irradiated with a photoacid generator, the tertbutyl ester is cleaved and the polymer becomes soluble in aqueous base. This type of copolymer can be used in 193-nm microlithography; images with resolutions of less than 200 nm have been obtained.

Original languageEnglish (US)
Pages (from-to)667-670
Number of pages4
JournalAngewandte Chemie - International Edition
Volume37
Issue number5
DOIs
StatePublished - Mar 16 1998

Keywords

  • Microlithography
  • Photoresists
  • Polymerizations

ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)

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