A new polymer transfer printing process was reported that avoids the solvent orthogonality problem in fabricating polymer multilayers, and which can be used to define patterns. Patterned multilayers were constructed by using a flat PDMS stamp and define the desired pattern in the polymer layer and using a structured PDMS stamp and uniformly coating with polymer. The images found demonstrate the capability of polymer transfer process to deposit patterned multi-layers, with sharp lateral interfaces. The ability to sequentially deposit well-defined functional layers enable the shunt resistance to be increased and thus offer greater detection sensitivity. The multi-layer structures show enhanced performance in respect of both quantum efficiency and reverse bias dark current over the single layer spin-coated structure.