Poly vinyl alcohol re-usable masters for microneedle replication

Marco Matteucci*, M. Fanetti, M. Casella, F. Gramatica, L. Gavioli, M. Tormen, G. Grenci, F. De Angelis, Enzo Di Fabrizio

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

33 Scopus citations

Abstract

We present the first results of microstructure replica with re-usable masters in poly vinyl alcohol (PVA). Microneedles of heights ranging from 500 to 1100 μm were fabricated through double-exposure deep X-ray lithography (DXRL) process and successfully replicated. A single PVA master was used as a template to successfully replicate up to 10 PMMA microneedle arrays, suggesting that this method might be a possible alternative to PDMS processes. A preliminary characterization of the relationship between the surface roughness of the substrates and the force required for demoulding was also performed.

Original languageEnglish (US)
Pages (from-to)752-756
Number of pages5
JournalMicroelectronic Engineering
Volume86
Issue number4-6
DOIs
StatePublished - Apr 1 2009

Keywords

  • DXRL
  • Microneedles
  • PMMA
  • PVA
  • Soft lithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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