Photoresist templates for wafer-scale defect-free evaporative lithography

Xiaosong Tang, Sean J. O'Shea, Ivan Uriev Vakarelski

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

A highly efficient evaporative lithography method for wafer-scale patterning of microwire networks is introduced. The method is based on the use of a photolithography defined photoresist as the template for the evaporative self-assembly of nanoparticles contained in liquid suspensions. An example application is given showing the patterning of conducting-transparent microwire coating composed of gold nanoparticles that outperform standard ITO coatings.

Original languageEnglish (US)
Pages (from-to)5150-5153
Number of pages4
JournalAdvanced Materials
Volume22
Issue number45
DOIs
StatePublished - Dec 1 2010

Keywords

  • Evaporative Self-assembly
  • Gold Nanoparticles
  • Transparent-Conducting Films

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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