Photorefractive properties of TNFM-sensitized PVK-based polymer composites and fully functionalized polymethacrylates

Eric Hendrickx*, David Van Steenwinckel, Christiaan Engels, Elke Gubbelmans, Kurt Van den Broeck, David Beljonne, Jean-Luc Bredas, Celest Samyn, Andre Persoons

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

We have studied the photorefractive properties of (2,4,7-trinitro-9-fluorenylidene)malononitrile (TNFM) sensitized poly(N-vinylcarbazole)/N-ethylcarbazole polymer composites doped with 2-(3,5,5-trimethylhex-2-ene-1-ylidene)-1,3-propanedinitrile and related dyes. Characterization included four-wave mixing experiments, two-beam coupling and photoconductivity measurements at a wavelength of 780 nm. At an applied field of 53 V/μm, we have observed complete internal diffraction and at 68 V/μm a gain coefficient of 230 cm-1. Small alterations in the chromophore donor group substituents were used to tune the ionization potential of the dopant dye by 0.3 eV. They affected the grating build-up time, photorefractive phase shift, and complexation with TNFM. This performance is compared to that of three newly synthesized polymethacrylates functionalized with carbazole, a dodecyl chain as an internal plasticizer and three different dyes. Here we observe net two-beam coupling gain and a diffraction efficiency of 60% at 58 V/μm.

Original languageEnglish (US)
Pages (from-to)130-139
Number of pages10
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4104
DOIs
StatePublished - Dec 1 2000
EventOrganic Photorefractives, Photoreceptors, and Nanocomposites - San Diego, CA, USA
Duration: Jul 31 2000Aug 1 2000

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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