Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation

Jean Frechet*, Man Kit Leung, Edward J. Urankar, C. Grant Willson, James F. Cameron, Scott A. MacDonald, Claus P. Niesert

*Corresponding author for this work

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19 Scopus citations

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Engineering & Materials Science