Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation

Jean Frechet*, Man Kit Leung, Edward J. Urankar, C. Grant Willson, James F. Cameron, Scott A. MacDonald, Claus P. Niesert

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

A chemically amplified resist material consisting of poly[2-cyano-2-(p-vinylphenyl) butanoic acid] and bis[[(2-nitrobenzyl)oxy]carbonyl]hexane-1,6-diamine has been designed and tested in negative and positive tone imaging. The resist operates on the principle of base-catalyzed decarboxylation. Amine generated by exposure to UV radiation catalyzes the thermal loss of carbon dioxide from the polymer side chain thereby changing the solubility of the resist film in aqueous base developer. Image reversal is accomplished by in situ silylation of the exposed and thermolyzed film followed by dry development using an oxygen plasma. The resist shows high sensitivity to deep UV irradiation, ca. 10 mJ/cm2, while image contrast is excellent.

Original languageEnglish (US)
Pages (from-to)2887-2893
Number of pages7
JournalChemistry of Materials
Volume9
Issue number12
DOIs
StatePublished - Jan 1 1997

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry

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