Photogenerated base and chemical amplification: a new resist based on catalyzed decarboxylation

Man Kit Leung*, Jean Frechet

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

13 Scopus citations

Abstract

The concept of chemical amplification in microlithography was developed in the early 1980's. Recently, our research group has successfully developed a series of effective amine-photogenerators such as carbamate. These results have encouraged us to design some novel polymers that are appropriate for lithographic processes under a novel base-catalyzed approach. This paper reports the design and the synthesis of a novel polymer, poly(2-cyano-2-(p-vinylphenyl)-butanoic acid) and demonstrates for the first time the concept of a chemical amplification using photogenerated base.

Original languageEnglish (US)
Title of host publicationPolymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering
PublisherPubl by ACS
Pages30-31
Number of pages2
ISBN (Print)0841226644
StatePublished - Jan 1 1993
EventProceedings of the American Chemical Society Division of Polymeric Materials - Science and Engineering - Denver, CO, USA
Duration: Apr 18 1993Apr 23 1993

Publication series

NamePolymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering
Volume68
ISSN (Print)0743-0515

Other

OtherProceedings of the American Chemical Society Division of Polymeric Materials - Science and Engineering
CityDenver, CO, USA
Period04/18/9304/23/93

ASJC Scopus subject areas

  • Chemical Engineering (miscellaneous)
  • Polymers and Plastics

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