Perovskite Thin Films via Atomic Layer Deposition

Brandon R. Sutherland, Sjoerd Hoogland, Michael M. Adachi, Pongsakorn Kanjanaboos, Chris T. O. Wong, Jeffrey J. McDowell, Jixian Xu, Oleksandr Voznyy, Zhijun Ning, Arjan J. Houtepen, Edward H. Sargent

Research output: Contribution to journalArticlepeer-review

141 Scopus citations

Abstract

© 2014 Wiley-VCH Verlag GmbH & Co. KGaA. (Graph Presented) A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3NH3PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm-1.
Original languageEnglish (US)
Pages (from-to)53-58
Number of pages6
JournalAdvanced Materials
Volume27
Issue number1
DOIs
StatePublished - Oct 30 2014
Externally publishedYes

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