Performance enhancement of electronic sensor through mask-less lithography

Anindya Nag, Asif I. Zia, S. C. Mukhopadhyay, Jürgen Kosel

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Scopus citations

Abstract

The escalating applications of miniaturized sensors have led the microelectronics industry to stay abreast with the precise micro-fabrication technologies. The following article describes a new technique for the fabrication of miniaturized interdigitated capacitive sensors that own highly sensitive and real-time detections capabilities. In standard lithographic procedure, the sensors are fabricated applying different photoresist materials that give rise to the variable characteristic profile of the fabricated product. Single crystal p-doped Silicon wafer was used as a substrate material due to its advantageous properties over Germanium. Heidelberg system was used for the maskless lithographic patterning of the new interdigital sensors on a silicon substrate. The process was carried out in a clean room in the absence of ultraviolet light at a fixed temperature. The fabricated sensors were used for inflammable gas sensing application. Electrochemical Impedance Spectroscopy was applied to read the resistive and capacitive impedance measured by the sensor. The results proclaimed that the fabricated sensors own better performance in LPG detection as compared to its commercial counterparts.
Original languageEnglish (US)
Title of host publication2015 9th International Conference on Sensing Technology (ICST)
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages374-379
Number of pages6
ISBN (Print)9781479963140
DOIs
StatePublished - Mar 30 2016

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