Patterning of hyperbranched resist materials by electron-beam lithography

Alexander R. Trimble, David C. Tully, Jean Frechet, David R. Medeiros, Marie Angelopoulos

Research output: Contribution to journalConference articlepeer-review

9 Scopus citations

Abstract

The application of hyperbranched polymers as a chemically amplified resist system for exposure by electron-beam (e-beam) is described. These materials incorporate acid labile tert-butyl carbonates (t-BOC) groups on the periphery as the imagable functionality. Exposure by e-beam and subsequent imaging in both the positive and negative tone has been accomplished. Continuous patterns with square profiles and line widths of 100 nm have been patterned in the negative tone. Unfortunately, this particular resist exhibits poor adhesion, and attempts to improve the adhesion have thus far been unsuccessful.

Original languageEnglish (US)
Pages (from-to)325-326
Number of pages2
JournalAmerican Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Volume41
Issue number1
StatePublished - Mar 1 2000
EventThe San Francisco Meeting - San Francisco, CA, USA
Duration: Mar 26 2000Mar 31 2000

ASJC Scopus subject areas

  • Polymers and Plastics

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