Patterned magnetic permalloy and nickel films: Fabrication by electron beam and X-ray lithographic techniques

Patrizio Candeloro*, Annamaria Gerardino, Enzo Di Fabrizio, Stefano Cabrini, Giorgio Giannini, Luigi Mastrogiacomo, Miguel Ciria, Robert C. O'Handley, Gianluca Gubbiotti, Giovanni Carlotti

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel rectangular and triangular dots and antidots on an area of (1 × 1) mm2. Dot dimensions and spacings range from 500 nm to 1 μm and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique.

Original languageEnglish (US)
Pages (from-to)5149-5152
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume41
Issue number8
StatePublished - Aug 2002
Externally publishedYes

Keywords

  • Brillouin light scattering
  • Chemical amplified resists
  • E-beam and X-ray lithographies
  • Magneto-optic Kerr effect magnetometry

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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