Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Souvik Chakrabarty, Christine Ouyang, Marie Krysak, Markos Trikeriotis, Kyoungyoung Cho, Emmanuel P. Giannelis, Christopher K. Ober

Research output: Chapter in Book/Report/Conference proceedingConference contribution

33 Scopus citations

Abstract

DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.
Original languageEnglish (US)
Title of host publicationExtreme Ultraviolet (EUV) Lithography IV
PublisherSPIE-Intl Soc Optical Eng
ISBN (Print)9780819494610
DOIs
StatePublished - Apr 1 2013
Externally publishedYes

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