Oxidative and carbonaceous patterning of Si surface in an organic media by scanning probe lithography

Matteo Lorenzoni*, Andrea Giugni, Bruno Torre

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

A simple top-down fabrication technique that involves scanning probe lithography on Si is presented. The writing procedure consists of a chemically selective patterning in mesitylene. Operating in an organic media is possible to perform local oxidation or solvent decomposition during the same pass by tuning the applied bias. The layer deposited with a positively biased tip with sub-100-nm lateral resolution consists of nanocrystalline graphite, as verified by Raman spectroscopy. The oxide pattern obtained in opposite polarization is later used as a mask for dry etching, showing a remarkable selectivity in SF6plasma, to produce Si nanofeatured molds.

Original languageEnglish (US)
Pages (from-to)1-9
Number of pages9
JournalNanoscale Research Letters
Volume8
Issue number1
DOIs
StatePublished - Mar 25 2013

Keywords

  • Dry etching mask
  • Nanocrystalline graphite
  • Scanning probe lithography

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics

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