One step electron-beam lithography for multipurpose diffractive optical elements with 200 nm resolution

E. Di Fabrizio*, L. Grella, M. Baciocchi, M. Gentili, D. Peschiaroli, L. Mastrogiacomo, R. Maggiora

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

Electron-beam lithography allows three-dimensional shaping of polymethylmethacrylate (PMMA) structures with minimum feature size of 200 nm for diffractive optical element fabrication. The key ep in fabrication of continuous PMMA profile is the resist process: contrast curve measurement a 40 and 50 kV as well as substrate thickness influence studies (bulk substrates and thin membrane) on resist slope profile were also carried out to determine the best process conditions. Examples of fabricated three-dimensional resist structures include: eight-level blazed PMMA profiles for x-ray focusing elements and a beam shaper for applications at a wavelength of λ=0.633 μm intrinsic flexibility and accuracy of the developed process, by which the wide range of diffractive optical elements were fabricated, is a direct consequence of the specifically developed and implemented three dimensional proximity correction algorithm. A detailed description of such an algorithm will also be given.

Original languageEnglish (US)
Pages (from-to)3855-3859
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume14
Issue number6
StatePublished - Nov 1996
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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