Nucleation mechanism of the target-facing sputtering

Xixiang Zhang*, Enyong Jiang, Jin e. Li, Yuguang Liu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

This paper studies the nucleation mechanism of the target-facing sputtering, and the variation of island-density with such parameters as deposition time and substrate temperature. This paper presents a simplified model of the nucleation and growth kinetics, and the results of the treatment based on this mode.

Original languageEnglish (US)
Pages (from-to)115-119
Number of pages5
JournalTianjin Daxue Xuebao (Ziran Kexue yu Gongcheng Jishu Ban)/Journal of Tianjin University Science and Technology
Issue number3
StatePublished - Dec 1 1988

ASJC Scopus subject areas

  • General

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