This paper studies the nucleation mechanism of the target-facing sputtering, and the variation of island-density with such parameters as deposition time and substrate temperature. This paper presents a simplified model of the nucleation and growth kinetics, and the results of the treatment based on this mode.
|Original language||English (US)|
|Number of pages||5|
|Journal||Tianjin Daxue Xuebao (Ziran Kexue yu Gongcheng Jishu Ban)/Journal of Tianjin University Science and Technology|
|State||Published - Dec 1 1988|
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