NEW CONDENSATION POLYMERS AS RESIST MATERIALS CAPABLE OF CHEMICAL AMPLIFICATION.

Jean M J Frechet*, Takashi Iizawa, Francine Bouchard, Maria Stanciulescu, C. Grant Willson, Nicholas Clecak

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

5 Scopus citations

Abstract

Significant advances in the field of materials which may be useful as E-Beam or X-Ray resists have been made based on the development of new chain growth polymers such as the polysulfones and substituted polyacrylates. Over the past few years the authors have been interested in the design of new types of resist materials which generally possess high sensitivities due to structural features which allow for the occurrence of radiation initiated chain processes. One such example of 'chemical amplification' is the radiation induced depolymerization of poly(phtalaldehyde). A new approach to resist materials which operate on a somewhat similar design has been described. The system is based on a two-component mixture consisting of a polymer with thermally labile bonds in its main-chain and a substance which can generate acid by exposure to radiation (e. g. triarylsulfonium salts). Typical examples of the types of reactive polymers designed are polycarbonates shown.

Original languageEnglish (US)
Title of host publicationPolymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Material
PublisherACS
Pages299-303
Number of pages5
Volume55
ISBN (Print)0841209855
StatePublished - 1986
Externally publishedYes

ASJC Scopus subject areas

  • Chemical Engineering (miscellaneous)
  • Polymers and Plastics

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