A new versatile negative-tone resist consisting of poly [4-hydroxystyrene-co-4-(3-furyl-3-hydroxypropyl)styrene], and a photoacid generator is described. This chemically amplified resist which shows high sensitivity in the deep-UV (2.3mJ/cm2) and E-Beam (3.4μC/cm2) modes, operates on the basis of radiation induced crosslinking via acid-catalyzed electrophilic aromatic substitution. Due to the incorporation of phenolic substituents in the resist design aqueous development without swelling is possible.
|Original language||English (US)|
|Number of pages||8|
|Journal||Proceedings of SPIE - The International Society for Optical Engineering|
|State||Published - 1991|
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics