New aqueous base-developable negative-tone photoresist based on furnas

James T. Fahey*, J. M J Frechet

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

A new versatile negative-tone resist consisting of poly [4-hydroxystyrene-co-4-(3-furyl-3-hydroxypropyl)styrene], and a photoacid generator is described. This chemically amplified resist which shows high sensitivity in the deep-UV (2.3mJ/cm2) and E-Beam (3.4μC/cm2) modes, operates on the basis of radiation induced crosslinking via acid-catalyzed electrophilic aromatic substitution. Due to the incorporation of phenolic substituents in the resist design aqueous development without swelling is possible.

Original languageEnglish (US)
Pages (from-to)67-74
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume1466
StatePublished - 1991
Externally publishedYes

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

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